Niobium Target
Product Niobium Target (Nb Target)
Part Number TRM-NB017
Material UNS R04210
Purity 99.95%
Density 8.57 g/cm3
CAS Number 7440-03-1

Niobium sputtering target is used in electronic industry. The purity is up to 99.99%. We can offer various dimensions in round / square/ rectangular shapes. Please contact us for more details.

Application: Sputtering targets

Thermostability 86%
Machinability 84%
Corrosion Resistance 85%
Inquiry

Order Information

Please include the following information with your inquires and orders:
1. Quantity
2. Dimensions
3. Purity, or R04210 Commercial Grade

Assay

Element R04200 (Reactor Grade) R04210 (Commercial Grade)
O  0.015% max  0.025% max
C 0.01% max 0.01% max
N 0.01% max 0.01% max
H 0.0015% max 0.0015% max
Zr 0.02% max 0.02% max
Fe  0.005% max  0.01% max
Si  0.005% max  0.005% max
W  0.03% max  0.005% max
Ni  0.005% max  0.0050% max
Mo  0.01% max  0.02% max
Hf  0.02% max  0.02% max
Ti  0.02% max  0.02% max
Ta  0.1% max  0.3% max
Nb Remainder Remainder

Typical Size Available (Please inquire for details)

Shape Dimension Tolerance
Round Sputtering Target 0.6″  to 15″ diameter x 0.12″ to 1″ thickness +/-0.010″  or on request
Rectangular and Flat Sputtering Target 0.04″ to 1.5″ thickness x up to 31″ width x 115″ Length +/-0.010″  or on request

Please refer to Niobium Sheet for regular products.

Specifications for the Niobium Sputtering Target

Item Specifications
Purity 99.9% or 99.95%
Recrystallization 95% min
Grain size 60 micron or ASTM 4 or better
Surface finish 16 Rms max. or Ra 0.4 (RMS64 or better)
Flatness 0.15% max

Physical Properties for Niobium

Physical properties Niobium (Atomic#41)
Phase Solid
Melting point 2750 K (2477°C, 4491°F)
Boiling point 5017 K (4744°C, 8571°F)
Heat of fusion 30 kJ/mol
Heat of vaporization 689.9 kJ/mol
Molar heat capacity 24.60 J/(mol•K)