Molybdenum Target
Product Molybdenum Target (Mo Sputtering Target)
Part Number TRM-MO017
Purity 99.95%
Type Round, Square, Rotary
Density 10.2 g/cm3
CAS# 7439-98-7

Sputtering is a type of the Physical Vapor Deposition Method. The molybdenum target can be divided into different types, including the square target, the round target, the plate target, the rotary target and the customized target. We can offer Molybdenum targets in various dimensions with purity up to 99.95%. Please contact us for more details.

Application:  Molybdenum targets are used in the flat-panel-display industries, the glass industry (including the architectural glass, the optical glass and the other films), the thin-film solar, the decorative coating, and the X-ray in the medicals.

Thermostability 89%
Machinability 85%
Corrosion Resistance 88%

Order Information

Please include the following information with your inquires and orders:
1. Quantity
2. Dimensions
3. Shapes or Drawings

Brief Introductions

Square and Round Mo Target
It can form films on various types of substrates, and these films can be used in the electronic components.

Plate Mo Target
The single plate can be used for the TFT sputtering and the coating equipment. Various dimensions are available on request, and it can be supplied in large sizes with the back plates.

Rotary Mo Target
It will be rotated at a slow speed with the stationary magnets during the operation. The efficiency is much higher than the Molybdenum Plate Target. The dimension is O.D 10’’ max., W.T .12’’-1’’ and Length 120’’ max.

Customized Mo target
Available on request.

Please refer to the Molybdenum Sheet, Molybdenum disc, and Molybdenum tubes for the other products.

Standard Packing

Wooden Boxes, Carton Boxes

Physical Properties Molybdenum (Atom#42)
Phase Solid
Melting Point 2896 K (2623°C, 4753°F)
Boiling Point 4912 K (4639°C, 8382°F)
Heat of Fusion 37.48 kJ/mol
Heat of Vaporization 598 kJ/mol
Molar Heat Capacity 24.06 J/(mol•K)
Atomic Weight 95.95
Thermal Conductivity 1.38 W/cm/K @ 298.2 K