| Product | Hafnium Oxide (HfO2) |
| Part Number | TRM-Hf006 |
| Purity (HfO2+ZrO2) | ≥99.5% |
| Density | 9.68 g/cm3 at 25°C (lit.) |
| CAS Number | 12055-23-1 |
Typical application: Hafnium Oxide (HfO2) is the raw material for the production of metal hafnium and hafnium alloy. It is also a ceramic material with a wide band gap and high dielectric constant. It is most likely to replace the gate insulating layer silica (SiO2), the core of the silicon based integrated circuit, the metal oxide semiconductor field effect tube (MOSFET) in microelectronics.
Features and Relative Products:
Order Information
Inquiries and orders should include the following information:
1. Quantity in weight,
2. Particle size, Purity
3. Additional requirements, if any.
Standard Packing
Iron Drums with a plastic bag inside. Net weight 25 kg or on request.
Physical Properties – Hafnium Oxide
| Form | Powder |
| Color | White |
| Formula | HfO2 |
| Molecular Weight | 210.49 |
| Melting Point | 2758°C |
| Boiling Point | 5400°C |
| Density | 9.68 g/cm3 at 25°C (lit.) |
| Solubility in H2O | Insoluble |
